光計測用光学機器と光計測システムのシナジーオプトシステムズ

PRODUCT OVERVIEW
EF (ENCIRCLED FLUX) / EAF (ENCIRCLED ANGULAR FLUX) MEASUREMENT SYSTEM

Photo:EF(Encircled Flux) measurement system

Encircled Flux (EF) and Encircled Angular Flux (EAF) measurement system is to measure mode diffusion of GI type or SI type multimode optical fiber with the image analysis of NFP and FFP images.

The system equips NFP optics, M-Scope type S/L for EF measurement, and FFP optics, M-Scope type F for EAF measurement. In combination with these optics, image sensor and Synos' Optical Beam Analysis Module AP-013, it is possible to measure and analyze EF/EAF and optical mode diffusion characteristic of GI/SI multimode optical fiber and optical device quickly and easily.

By selecting optical sensor, it will be applicable for optical beam profile observation and analysis from visible to 1.55um wavelength range, corresponding to measurement wavelength and purpose.

EF/EAF MEASUREMENT

EF (ENCIRCLED FLUX) /EAF (ENCIRCLED ANGULAR FLUX) MEASUREMENT

The loss of multimode fiber will vary depending on launch condition so that it is necessary to verify launch condition at the measurement. As a new method, EF (Encircled Flux) / EAF (Encircled angular flux) is used to define such launch condition. Especially, EF (Encircled Flux) / EAF (Encircled angular flux) plays an important role for high speed multimode transmission.

EF (Encircled Flux) MEASUREMENT

Encircled flux is a value obtained by integrating from the center toward the outer peripheral portion of the light intensity distribution of optical fiber edge. Against light intensity distribution of the entire optical mode, it is an indicator of what is a percentage on the intensity in the range from the center to radius(r) and is represented by the formula and graphs in the figure on the left side.

EF analysis is proceeded based on the NFP image data of fiber edge acquired by NFP measurement optics. (About system component, please refer <SYSTEM COMPONENT> shown below.

EAF (Encircled Angular Flux) MEASUREMENT

Encircled Angular flux is the integral value for the intensity distribution of the emission angle from the edge, from the center of angular spread to N.A. direction.

EAF analysis is proceeded based on the FFP image data from fiber acquired by FFP measurement optics. (About system component, please refer <SYSTEM COMPONENT> shown below.

EF/EAF MEASUREMENT AND MMF

In general, EF (Encircled Flux) is applied for GI (Graded Index) type MMF, and EAF (Encircled Angular Flux) is applied for SI (Step Index) type MMF.

MEASUREMENT STANDARD

As for corresponding to high speed transmission like 10Gbps etc., EF (Encircled Flux) measurement method is regulated as IEC61280-1-4 as regulation of new launch condition for GI MMF.

On the other hand, EAF (Encircled Angular Flux) measurement method is regulated as IEC61300-3053 as regulation of new launch condition for SI MMF.

 

FEATURE

  • Easy to use and efficient EF/EAF measurement system by dedicated optics and image processing method.
    • Synos’ M-Scope type S, sophisticated NFP measurement optics, is adopted as for EF (Encircled Flux) measurement optics.
      • Simplified NFP measurement optics M-Scope type L is also available.
    • Synos' M-Scope type F, FFP measurement optics, is adopted as for EAF (Encircled Angular Flux) measurement optics.
  • Synos' Optical Beam Analysis Module AP-013, image processing, data aquisition and analysis system for optical beam analysis.
    • All-in-one package system with PC for data processing, Optical beam analysis software Optometrics BA Standard, sensor driver software, calibration data set for data analysis. Possible to start up measurement system quickly after system introduction.
    • Optometrics BA Standard, specially designed high-functional software for optical beam profile analysis.
      • EF/EAF analysis function is installed as standard function.
      • Essential and useful functionality for NFP, FFP, beam profile analysis are equipped in Optometrics BA Standard.
  • Possible to select suitable image sensor from visible to NIR region
    • Visible - 1100nm : ISA011, high resolution digital CCD detector
    • 950nm - 1700nm : ISA041H2/ISA041, InGaAs high sensitivity NIR detector
  • Special launch optics is prepared as optional unit.
    • Underfilled launch optical system M-Scope type G : Possible to control launch condition such as N.A., diameter of input light
    • Mode-selective launch optical system M-Scope type ML : Possible to select specified angle (N.A.) component of launch light to the sample fibers

APPLICATION

  • Optical mode diffusion evaluation of GI (graded index) type / SI (step index) type MMF (multimode optical fiber)
  • Optical mode diffusion evaluation of POF (plastic optical fiber)
  • Optical mode diffusion evaluation of multimode optical device such as polymer optical waveguide for OPCB substrate etc.

SYSTEM COMPONENT SELECTION

MAIN COMPONENT

ENCIRCLED FLUX MEASUREMENT SYSTEM
ENCIRCLED ANGULAR FLUX MEASUREMENT SYSTEM

OPTION

  • Objective lens selection (for EF measurement system)
    • About objective lens selection, please refer to here.
  • Neutral density filter
    • About neutral density filter, please refer to here.
  • Coaxial epi-illumination unit (for EF measurement system)
    • About coaxial epi-illumination unit, refer to here.
  • Optics base and workbench
    • Optics base unit for optical fiber measurement
    • Vertical workbench for optics
    • About optics base and workbench, please refer to here.

OPTICAL BEAM ANALYSIS SOFTWARE HAVING EF/EAF ANALYSIS FUNCTION / Optometrics BA Standard
EF (Encircled Flux) /EAF (Encircled Angular Flux) ANALYSIS FUNCTION

Synos' optical beam analysis software has EF/EAF analysis function as standard function.

In addition to EF/EAF analysis and EF/EAF graph display function, it also has EF/EAF mask display function. It is also possible to output and save calculated EF/EAF data as csv data.

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